The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Jan. 12, 2022
Asml Netherlands B.v., Veldhoven, NL;
Petrus Wilhelmus Smorenburg, Veldhoven, NL;
Johan Reinink, Uden, NL;
Marinus Petrus Reijnders, Eindhoven, NL;
Han-Kwang Nienhuys, Utrecht, NL;
David O'dwyer, Eindhoven, NL;
Sander Bas Roobol, Veldhoven, NL;
Christina Lynn Porter, Veldhoven, NL;
Stephen Edward, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An assembly and method for separating first radiation and second radiation in the far field, wherein the first radiation and the second radiation have non-overlapping wavelengths, The assembly comprises a capillary structure, wherein the first radiation and the second radiation propagate coaxially along at least a portion of the capillary structure, and an optical structure configured to control the spatial distribution of the first radiation outside of the capillary structure, through interference, such that the intensity of the first radiation in the far field is reduced along an optical axis of the second radiation.