The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2021
Filed:
Feb. 16, 2018
Asml Netherlands B.v., Veldhoven, NL;
Sander Bas Roobol, Veldhoven, NL;
Simon Gijsbert Josephus Mathijssen, Rosmalen, NL;
Stefan Michael Bruno Bäumer, Valkenswaard, NL;
ASML Netherlands B.V, Veldhoven, NL;
Abstract
A method of aligning a diffractive optical system, to be operated with an operating beam, comprises: aligning () the diffractive optical system using an alignment beam having a different wavelength range from the operating beam and using a diffractive optical element optimized () to diffract the alignment beam and the operating beam in the same (or a predetermined) direction. In an example, the alignment beam comprises infra-red (IR) radiation and the operating beam comprises soft X-ray (SXR) radiation. The diffractive optical element is optimized by providing it with a first periodic structure with a first pitch (pIR) and a second periodic structure with a second pitch (pSXR). After alignment, the vacuum system is pumped down () and in operation the SXR operating beam is generated () by a high harmonic generation (HHG) optical source pumped by the IR alignment beam' optical source.