The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2021
Filed:
May. 17, 2018
Asml Netherlands B.v., Veldhoven, NL;
Johannes Franciscus Martinus D'Achard Van Enschut, Eindhoven, NL;
Tamara Druzhinina, Eindhoven, NL;
Nitish Kumar, Eindhoven, NL;
Sarathi Roy, Eindhoven, NL;
Yang-Shan Huang, Veldhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Han-Kwang Nienhuys, Utrecht, NL;
Pieter-Jan Van Zwol, Eindhoven, NL;
Sander Bas Roobol, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Disclosed is a method and associated inspection apparatus for detecting variations on a surface of a substrate. The method comprises providing patterned inspection radiation to a surface of a substrate. The inspection radiation is patterned such that an amplitude of a corresponding enhanced field is modulated in a manner corresponding to the patterned inspection radiation. The scattered radiation resultant from interaction between the enhanced field and the substrate surface is received and variations on the surface of the substrate are detected based on the interaction between the enhanced field and the substrate surface. Also disclosed is a method of detecting any changes to at least one characteristic of received radiation, the said changes being induced by the generation of a surface plasmon at said surface of the optical element.