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Veldhoven, Netherlands

Yang-Shan Huang

This inventor holds 21 USPTO granted patents and 5 published patent applications and 2 EPO patents. Top assignees: Asml Netherlands B.v., Asml Holding N.v.. Active years: 2014-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yang-Shan Huang. Retrieved from https://idiyas.com/inventor/yang-shan-huang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.6

ph-index = 3

Forward Citations = 17(Granted Patents)


Location History:

  • Velhoven, NL (2017)
  • Veldhoven, NL (2014 - 2024)

Company Filing History:

goldMedal21 out of 5,070 
 
Asml Netherlands B.v.
 patents
silverMedal5 out of 629 
 
Asml Holding N.v.
 patents
where one patent can have more than one assignee

Years Active: 2014-2025

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21 patents (USPTO):Explore Patents
1. 12332570 - Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris (2025-06-17),
2. 12032296 - Fluid handling system, method and lithographic apparatus (2024-07-09),
3. 11961698 - Replaceable module for a charged particle apparatus (2024-04-16),
4. 11460786 - Positioning system and a method for positioning a substage or a stage with respect to a frame (2022-10-04),
5. 11442369 - Object stage bearing for lithographic apparatus (2022-09-13),
6. 11232960 - Pick-and-place tool having multiple pick up elements (2022-01-25),
7. 11204558 - Particle suppression systems and methods (2021-12-21),
8. 11175596 - Particle traps and barriers for particle suppression (2021-11-16),
9. 11137694 - Particle suppression systems and methods (2021-10-05),
10. 11092902 - Method and apparatus for detecting substrate surface variations (2021-08-17),
11. 11003095 - Positioning system and lithographic apparatus (2021-05-11),
12. 10705438 - Lithographic method (2020-07-07),
13. 10571814 - Lithographic method (2020-02-25),
14. 9921494 - Lithographic apparatus comprising an actuator, and method for protecting such actuator (2018-03-20),
15. 9811005 - Lithographic apparatus and device manufacturing method (2017-11-07),

Title: Yang-Shan Huang: A Trailblazer in Innovation

Introduction:

In the realm of inventions and technological advancements, there are individuals who stand out for their relentless pursuit of innovation and commitment to pushing the boundaries of technology. One such trailblazer in the world of inventions is Yang-Shan Huang, a visionary inventor based in Veldhoven, NL, who has made significant contributions to the field with his pioneering work.

Latest Patents:

Yang-Shan Huang holds an impressive portfolio of 20 patents, showcasing his expertise in various areas of technology. His latest patents include a groundbreaking Fluid Handling System, Method, and Lithographic Apparatus, which revolutionizes the way immersion liquid is confined in lithographic processes. Additionally, his Replaceable Module for a Charged Particle Apparatus offers a versatile solution for manipulating charged particle paths within advanced scientific instruments.

Career Highlights:

Having worked at renowned companies such as ASML Netherlands B.V. and ASML Holding N.V., Yang-Shan Huang has honed his skills and expertise in the forefront of technological innovation. His contributions to the development of cutting-edge technologies have been instrumental in shaping the future of the industry.

Collaborations:

Throughout his career, Yang-Shan Huang has collaborated with esteemed professionals in the field, including Sven Antoin Johan Hol and Johannes Petrus Martinus Bernardus Vermeulen. These collaborations have led to the creation of groundbreaking inventions and have paved the way for new advancements in technology.

Conclusion:

In conclusion, Yang-Shan Huang's dedication to innovation and his unparalleled commitment to pushing the boundaries of technology make him a true trailblazer in the world of inventions. His remarkable achievements in the field serve as an inspiration to aspiring inventors and underscore the importance of relentless pursuit of innovation in driving progress and shaping the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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