Asml Netherlands B.v.

Asml Holding N.v.

Yang-Shan Huang

Johannes Petrus Martinus Bernardus Vermeulen

Theodorus Petrus Maria Cadee

Sven Antoin Johan Hol

Jan Van Eijk

Han-Kwang Nienhuys

Antonius Franciscus Johannes De Groot

Hans Butler

Andre Bernardus Jeunink

Richard Joseph Bruls

Bearrach Moest

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Laurentius Johannes Adrianus Van Bokhoven

Hoite Pieter Theodoor Tolsma

Stefan Carolus Jacobus Antonius Keij

Antonie Hendrik Verweij

Ronald Peter Albright

Enno Van Den Brink

Sander Christiaan Broers

Stan Henricus Van Der Meulen

Jacob Brinkert

Federico La Torre

Christine Henriette Schouten

Arie Jeffrey Den Boef

Nicolaas Ten Kate

Marcus Adrianus Van De Kerkhof

Johannes Hubertus Josephina Moors

Johannes Henricus Wilhelmus Jacobs

Engelbertus Antonius Fransiscus Van Der Pasch

Xuedong Liu

Raymond Wilhelmus Louis Lafarre

Pieter Willem Herman De Jager

Marco Koert Stavenga

Xuerang Hu

Coen Adrianus Verschuren

Andrey Alexandrovich Nikipelov

Pieter-Jan Van Zwol

Peter Conrad Kochersperger

Ruud Antonius Catharina Maria Beerens

Sander Bas Roobol

Olav Waldemar Vladimir Frijns

Hendrikus Gijsbertus Schimmel

Theo Anjes Maria Ruijl

Wilhelmus Henricus Theodorus Maria Aangenent

Robbert Edgar Van Leeuwen

Johannes Antonius Gerardus Akkermans

Sarathi Roy

Daniel Nathan Burbank

Alexey Olegovich Polyakov

Marc Smits

Tamara Druzhinina

Petrus Theodorus Rutgers

Christiaan Louis Valentin

Krijn Frederik Bustraan

Nitish Kumar

Edwin Te Sligte

Manish Ranjan

Maarten Hartger Kimman

Zhuangxiong Huang

Gerard Johannes Pieter Nijsse

Marinus Maria Johannes Van De Wal

Qingpo Xi

Pieter Cornelis Johan De Jager

Kursat Bal

Christiaan Otten

Parham Yaghoobi

Jasper Anne Frido Marikus Simons

Jeroen De Boeij

Xinan Luo

Stijn Wilem Herman Karel Steenbrink

Simon Bernardus Cornelis Maria Martens

Karl Robert Umstadter

Michael Wilhelmus Theodorus Koot

Johannes Franciscus Martinus D'Achard Van Enschut

Laura Del Tin

Edwin Van Horne

Marcel Joseph Louis Boonen

Peter Laurentius Maria Ros

Wei Zhou

Rob Reilink

Jasper Leonardus Johannes Scholten

Christan Teunissen

Peter-Paul Crans

Sjoerd Frans De Vries

Thomas Maarten Raasveld

Eray Uzgören

Vadim Yevgenyevich Joseph Banine

Minkyu Kim

Georgi Nenchev Nenchev

Ronald Josephus Maria Lamers

An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.

Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris

A fluid handling system that includes a liquid confinement structure configured to confine immersion liquid to a space between at least a part of the liquid confinement structure and a surface of a substrate. The fluid handling system also includes a mechanism configured to vibrate a vibration component in contact with the immersion liquid.

Fluid handling system, method and lithographic apparatus

Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.

Replaceable module for a charged particle apparatus

A method for positioning a substage (), supported by a main stage (), relative to a reference object, the substage moveable in a direction () between a first and second position relative to the main stage. The method includes positioning the first stage using a passive force system that is activated by positioning the main stage. The passive force system includes two magnet systems (), each magnet system being configured to apply a force in the direction to the first stage with respect to the second stage in a non-contact manner, the forces resulting in a resultant force applied to the first stage in the direction by the passive force system. A magnitude and/or a direction of the resultant force depends on the position of the first stage relative to the second stage, and the first stage has a zero-force position between the first and second position in which the resultant force is zero.

Positioning system and a method for positioning a substage or a stage with respect to a frame

An object stage bearing system can include an object stage, a hollow shaft coupled to the object stage, and an in-vacuum gas bearing assembly coupled to the hollow shaft and the object stage. The in-vacuum gas bearing assembly can include a gas bearing, a scavenging groove, and a vacuum groove. The gas bearing is disposed along an inner wall of the in-vacuum gas bearing assembly and along an external wall of the hollow shaft. The scavenging groove is disposed along the inner wall such that the scavenging groove is isolated from the gas bearing. The vacuum groove is disposed along the inner wall such that the vacuum groove is isolated from the scavenging groove and the gas bearing.

Object stage bearing for lithographic apparatus

A pick-and-place tool including a plurality of movable holder structures, and a plurality of pick-and-place structures, each holder structure accommodating two or more of the pick-and-place structures, wherein at least one of the two or more pick-and-place structures of a respective holder structure is able to move along a respective holder structure independently from another at least one of the two or more pick-and-place structures of the respective holder structure, and wherein each pick-and-place structure includes a pick-up element configured to pick up a donor component at a donor structure and place the donor component an acceptor structure.

Pick-and-place tool having multiple pick up elements

An object stage that includes a first structure and a second structure movable relative to the first structure. The second structure is configured to support an object. The object stage also includes a seal plate movably coupled to the first structure or the second structure, but not both. Further, the object stage includes an actuator configured to move the seal plate such that a substantially constant gap is defined between the seal plate and the first structure or second structure that is not coupled to the seal plate.

Particle suppression systems and methods

Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.

Particle traps and barriers for particle suppression

A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.

Disclosed is a method and associated inspection apparatus for detecting variations on a surface of a substrate. The method comprises providing patterned inspection radiation to a surface of a substrate. The inspection radiation is patterned such that an amplitude of a corresponding enhanced field is modulated in a manner corresponding to the patterned inspection radiation. The scattered radiation resultant from interaction between the enhanced field and the substrate surface is received and variations on the surface of the substrate are detected based on the interaction between the enhanced field and the substrate surface. Also disclosed is a method of detecting any changes to at least one characteristic of received radiation, the said changes being induced by the generation of a surface plasmon at said surface of the optical element.

Method and apparatus for detecting substrate surface variations

A positioning system for positioning an object. The positioning system includes a stage, a balance mass and an actuator system. The stage is for holding the object. The actuator system is arranged to drive the stage in a first direction while driving the balance mass in a second direction opposite to the first direction. The stage is moveable in the first direction in a movement range. When the stage is moving in the first direction and is at an end of the movement range, the positioning system is arranged to collide the stage frontally into the balance mass.

Positioning system and lithographic apparatus

A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.

Lithographic method

A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.

A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.

Lithographic apparatus comprising an actuator, and method for protecting such actuator

A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.

Lithographic apparatus and device manufacturing method

Growing community of inventors

Veldhoven, Netherlands

Yang-Shan Huang