The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2025
Filed:
Dec. 24, 2020
Asml Holding N.v., Veldhoven, NL;
Asml Netherlands B.v., Veldhoven, NL;
Ronald Peter Albright, Norwalk, CT (US);
Kursat Bal, Arnhem, NL;
Vadim Yevgenyevich Joseph Banine, Deurne, NL;
Richard Joseph Bruls, Eindhoven, NL;
Sjoerd Frans De Vries, Eindhoven, NL;
Olav Waldemar Vladimir Frijns, Rosmalen, NL;
Yang-Shan Huang, Veldhoven, NL;
Zhuangxiong Huang, Eindhoven, NL;
Johannes Henricus Wilhelmus Jacobs, Heeze, NL;
Johannes Hubertus Josephina Moors, Roosteren, NL;
Georgi Nenchev Nenchev, Veldhoven, NL;
Andrey Nikipelov, Eindhoven, NL;
Thomas Maarten Raasveld, Eindhoven, NL;
Manish Ranjan, Eindhoven, NL;
Edwin Te Sligte, Waalre, NL;
Karl Robert Umstadter, San Diego, CA (US);
Eray Uzgören, Eindhoven, NL;
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Parham Yaghoobi, Eindhoven, NL;
ASML Holding N.V., Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.