Thomas Maarten Raasveld

Title: The Innovations of Thomas Maarten Raasveld

Introduction

Thomas Maarten Raasveld is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of lithography, particularly with his innovative patent that addresses the challenges of particulate debris in radiation systems.

Latest Patents

Raasveld holds a patent for a lithographic system equipped with a deflection apparatus designed to change the trajectory of particulate debris. This apparatus includes a radiation receiving component that features an opening to receive radiation from a source. The deflection apparatus is specifically arranged to alter the path of particles entering through the opening, enhancing the efficiency and effectiveness of lithographic processes.

Career Highlights

Throughout his career, Raasveld has worked with prominent companies in the technology sector, including ASML Holding N.V. and ASML Netherlands B.V. His work at these organizations has allowed him to contribute to advancements in lithographic technology, which is crucial for semiconductor manufacturing.

Collaborations

Raasveld has collaborated with several professionals in his field, including Ronald Peter Albright and Kursat Bal. These collaborations have fostered innovation and development in lithographic systems.

Conclusion

Thomas Maarten Raasveld's contributions to lithography through his patent and work with leading companies highlight his role as an influential inventor in the technology sector. His innovations continue to impact the industry significantly.