Growing community of inventors

Eindhoven, Netherlands

Thomas Maarten Raasveld

Average Co-Inventor Count = 1.00

ph-index = 1

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 0

Thomas Maarten RaasveldMarcus Adrianus Van De Kerkhof (1 patent)Thomas Maarten RaasveldRichard Joseph Bruls (1 patent)Thomas Maarten RaasveldYang-Shan Huang (1 patent)Thomas Maarten RaasveldOlav Waldemar Vladimir Frijns (1 patent)Thomas Maarten RaasveldRonald Peter Albright (1 patent)Thomas Maarten RaasveldZhuangxiong Huang (1 patent)Thomas Maarten RaasveldManish Ranjan (1 patent)Thomas Maarten RaasveldKursat Bal (1 patent)Thomas Maarten RaasveldParham Yaghoobi (1 patent)Thomas Maarten RaasveldKarl Robert Umstadter (1 patent)Thomas Maarten RaasveldSjoerd Frans De Vries (1 patent)Thomas Maarten RaasveldEray Uzgören (1 patent)Thomas Maarten RaasveldVadim Yevgenyevich Joseph Banine (1 patent)Thomas Maarten RaasveldGeorgi Nenchev Nenchev (1 patent)Thomas Maarten RaasveldThomas Maarten Raasveld (1 patent)Marcus Adrianus Van De KerkhofMarcus Adrianus Van De Kerkhof (105 patents)Richard Joseph BrulsRichard Joseph Bruls (36 patents)Yang-Shan HuangYang-Shan Huang (21 patents)Olav Waldemar Vladimir FrijnsOlav Waldemar Vladimir Frijns (20 patents)Ronald Peter AlbrightRonald Peter Albright (7 patents)Zhuangxiong HuangZhuangxiong Huang (7 patents)Manish RanjanManish Ranjan (7 patents)Kursat BalKursat Bal (4 patents)Parham YaghoobiParham Yaghoobi (3 patents)Karl Robert UmstadterKarl Robert Umstadter (2 patents)Sjoerd Frans De VriesSjoerd Frans De Vries (1 patent)Eray UzgörenEray Uzgören (1 patent)Vadim Yevgenyevich Joseph BanineVadim Yevgenyevich Joseph Banine (1 patent)Georgi Nenchev NenchevGeorgi Nenchev Nenchev (1 patent)
..
Inventor’s number of patents
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Strength of working relationships

Company Filing History:

1. Asml Netherlands B.v. (1 from 4,836 patents)

2. Asml Holding N.v. (1 from 613 patents)


1 patent:

1. 12332570 - Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris

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