Sjoerd Frans De Vries

Title: Sjoerd Frans De Vries: Innovator in Lithographic Systems

Introduction

Sjoerd Frans De Vries is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of lithography, particularly through his innovative patent. His work has implications for the efficiency and effectiveness of radiation receiving apparatuses.

Latest Patents

Sjoerd holds a patent for a "Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris." This invention includes an apparatus that features a radiation receiving component with an opening designed to receive radiation from a source. The deflection apparatus within this system is specifically arranged to alter the trajectory of particles entering through the opening, enhancing the performance of lithographic processes.

Career Highlights

Throughout his career, Sjoerd has worked with prominent companies in the technology sector, including ASML Holding N.V. and ASML Netherlands B.V. His experience in these organizations has allowed him to develop and refine his innovative ideas in lithography.

Collaborations

Sjoerd has collaborated with several professionals in his field, including Ronald Peter Albright and Kursat Bal. These partnerships have contributed to the advancement of his projects and the successful implementation of his inventions.

Conclusion

Sjoerd Frans De Vries is a distinguished inventor whose work in lithographic systems has made a significant impact on the industry. His innovative patent demonstrates his commitment to advancing technology in this field.