Vadim Yevgenyevich Joseph Banine

Title: Vadim Yevgenyevich Joseph Banine: Innovator in Lithographic Systems

Introduction

Vadim Yevgenyevich Joseph Banine is a notable inventor based in Deurne, Netherlands. He has made significant contributions to the field of lithography, particularly with his innovative patent that addresses the challenges of particulate debris in radiation systems.

Latest Patents

Banine holds a patent for a "Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris." This invention includes a radiation receiving apparatus equipped with an opening that allows radiation from a source to pass through. The deflection apparatus is designed to alter the trajectory of particles entering the radiation receiving apparatus, thereby enhancing the efficiency and effectiveness of lithographic processes.

Career Highlights

Throughout his career, Banine has worked with prominent companies in the technology sector, including ASML Holding N.V. and ASML Netherlands B.V. His experience in these organizations has allowed him to develop and refine his expertise in lithographic systems and related technologies.

Collaborations

Banine has collaborated with several professionals in his field, including Ronald Peter Albright and Kursat Bal. These collaborations have contributed to the advancement of his work and the development of innovative solutions in lithography.

Conclusion

Vadim Yevgenyevich Joseph Banine is a distinguished inventor whose work in lithographic systems has made a significant impact on the industry. His innovative patent and collaborations with leading professionals highlight his contributions to advancing technology in this field.