The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2021
Filed:
Jul. 18, 2018
Asml Netherlands B.v., Veldhoven, NL;
Asml Holding N.v., Veldhoven, NL;
Han-Kwang Nienhuys, Utrecht, NL;
Ronald Peter Albright, Norwalk, CT (US);
Jacob Brinkert, Schalkhaar, NL;
Yang-Shan Huang, Veldhoven, NL;
Hendrikus Gijsbertus Schimmel, Utrecht, NL;
Antonie Hendrik Verweij, Dussen, NL;
ASML Netherlands B.V., Veldhoven, NL;
ASML Holding N.V., Veldhoven, NL;
Abstract
Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.