The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2018
Filed:
Apr. 12, 2013
Asml Netherlands B.v., Veldhoven, NL;
Theodorus Petrus Maria Cadee, Asten, NL;
Sander Christiaan Broers, Weert, NL;
Sven Antoin Johan Hol, Eindhoven, NL;
Yang-Shan Huang, Veldhoven, NL;
Antonius Franciscus Johannes De Groot, Someren, NL;
Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Rosmalen, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.