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For the Inventor, By the Inventor

Eindhoven, Netherlands

Sven Antoin Johan Hol

USPTO Granted Patents = 38


Average Co-Inventor Count = 4.4

ph-index = 8

Forward Citations = 139(Granted Patents)


Location History:

  • Yokahama, JP (2008)
  • Yokohama, JP (2008 - 2011)
  • Veldhoven, NL (2018)
  • Eindhoven, NL (2004 - 2019)
  • San Jose, CA (US) (2020 - 2023)

Company Filing History:

goldMedal38 out of 4,883 
 
Asml Netherlands B.v.
 patents

Years Active: 2004-2023

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38 patents (USPTO):
1. 11621142 - Substrate positioning device and electron beam inspection tool (2023-04-04),
2. 11315752 - E-beam apparatus (2022-04-26),
3. 10867770 - E-beam apparatus (2020-12-15),
4. 10372045 - Method of calibrating a reluctance actuator assembly, reluctance actuator and lithographic apparatus comprising such reluctance actuator (2019-08-06),
5. 9927711 - Actuation mechanism, optical apparatus and lithography apparatus (2018-03-27),
6. 9921494 - Lithographic apparatus comprising an actuator, and method for protecting such actuator (2018-03-20),
7. 9785051 - Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices (2017-10-10),
8. 9535340 - Support for a movable element and lithography apparatus (2017-01-03),
9. 9494878 - Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices (2016-11-15),
10. 9494869 - Lithographic apparatus and device manufacturing method (2016-11-15),
11. 9329501 - Lithographic apparatus, method of deforming a substrate table and device manufacturing method (2016-05-03),
12. 9293951 - Lithographic apparatus and lorentz actuator (2016-03-22),
13. 9172294 - Planar motor and lithographic apparatus comprising such planar motor (2015-10-27),
14. 9110387 - Lithographic apparatus comprising a substrate table and a surface substrate actuator (2015-08-18),
15. 9081307 - Variable reluctance device, stage apparatus, lithographic apparatus and device manufacturing method (2015-07-14),

Title: The Innovative Journey of Inventor Sven Antoin Johan Hol

Introduction:

Sven Antoin Johan Hol, a prolific inventor based in Eindhoven, NL, has made significant contributions to the field of electron beam technology with an impressive portfolio of 38 patents.

Latest Patents:

Among his recent innovations are the "Substrate Positioning Device and Electron Beam Inspection Tool," which revolutionizes electron beam apparatus design by incorporating advanced actuator systems for precise substrate manipulation and projection.

Career Highlights:

Sven Hol's expertise shines through his work at ASML Netherlands B.V., a leading semiconductor equipment manufacturer. His relentless pursuit of technological advancements has fueled his success in developing cutting-edge solutions for the industry.

Collaborations:

Throughout his career, Sven Hol has collaborated with esteemed colleagues such as Henrikus Herman Marie Cox and Patricia Vreugdewater, enhancing the synergy of knowledge and creativity in driving innovation forward.

Conclusion:

Inventor Sven Antoin Johan Hol's passion for pushing the boundaries of electron beam technology has cemented his reputation as a visionary in the field. His dedication to excellence and collaboration underscores his commitment to shaping the future of innovation in the semiconductor industry.

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