Asml Netherlands B.v.

Sven Antoin Johan Hol

Henrikus Herman Marie Cox

Patricia Vreugdewater

Harmen Klaas Van Der Schoot

Jan Van Eijk

Edwin Johan Buis

Erik Roelof Loopstra

Johannes Petrus Martinus Bernardus Vermeulen

Hans Butler

Theodorus Petrus Maria Cadee

Yang-Shan Huang

Niels Johannes Maria Bosch

Hernes Jacobs

Antonius Franciscus Johannes De Groot

Marcel Koenraad Marie Baggen

Petrus Matthijs Henricus Vosters

Peter Paul Hempenius

Henricus Martinus Johannes Van De Groes

Angelo Cesar Peter De Klerk

Erik Maria Rekkers

Maarten Frans Janus Kremers

Gosse Charles De Vries

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Johan Cornelis Compter

Marinus Johannes Maria Van Dam

Wilhelmus Henricus Theodorus Maria Aangenent

Johannes Antonius Gerardus Akkermans

Sebastiaan Maria Johannes Cornelissen

Robertus Nicodemus Jacobus Van Ballegoij

Peter Michel Silvester Maria Heijmans

Olof Martinus Josephus Fischer

Fidelus Adrianus Boon

Maarten Hartger Kimman

Fransicus Mathijs Jacobs

Mark Scholten

Jeroen De Boeij

Marijn Kessels

Daniël Godfried Emma Hobbelen

Patricius Aloysius Jacobus Tinnemans

Arno Jan Bleeker

Joeri Lof

Harmeet Singh

Engelbertus Antonius Fransiscus Van Der Pasch

Koen Jacobus Johannes Maria Zaal

Jan Bernard Plechelmus Van Schoot

Marc Wilhelmus Maria Van Der Wijst

Hendricus Johannes Maria Meijer

Ramon Pascal Van Gorkom

Wilhelmus Franciscus Johannes Simons

Ruud Antonius Catharina Maria Beerens

Bernardus Antonius Slaghekke

Johannes Hubertus Antonius Van De Rijdt

Hako Botma

Robbert Edgar Van Leeuwen

Pieter Renaat Maria Hennus

Petrus Theodorus Rutgers

Arjan Franklin Bakker

Gerard Johannes Pieter Nijsse

Sander Christiaan Broers

Robrecht Emiel Maria Leonia De Weerdt

Erwin Wijn

Robert Johannes Petrus Van Diesen

Robertus Jacobus Theodorus Van Kempen

Martinus Hendricus Henricus Hoeks

Michael Wilhelmus Theodorus Koot

David William Callan

Sjoerd Martijn Huiberts

Simon Bernardus Cornelis Maria Martens

Abdelhamid Kechroud

Hendrikus Pascal Gerardus Johannes Van Agtmaal

George Wilhelmus Johannes Clijsen

Wei Zhou

Koen Jacobus Johannes Marie Zaal

Piet Vosters

Angelo Oscar Peter De Klerk

Bas Pieter Lemmen

Andrea Lodovico Mancuso

Jacob Kornelis Ter Veer

Geert-Jan Petrus Naaijkens

Simon Maria Jan Cornelissen

An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.

Substrate positioning device and electron beam inspection tool

An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.

E-beam apparatus

A reluctance actuator assembly comprising a reluctance actuator, a flux sensor to measure a magnetic flux in a gap of the reluctance actuator, and a flux amplifier to drive an actuator coil of the reluctance actuator based on a flux set point and the flux measured by the flux sensor. A method comprising providing to the flux amplifier a flux setpoint, the flux setpoint comprising a time constant component and a sinusoidally varying component at an excitation frequency, measuring a force generated by the reluctance actuator in response to the flux setpoint, and calibrating the reluctance actuator assembly from the measured force.

Method of calibrating a reluctance actuator assembly, reluctance actuator and lithographic apparatus comprising such reluctance actuator

An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets (). A moving part includes a permanent magnet () with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. A ferromagnetic shield () is provided around the moving part and has at least one interruption () to reduce the influence of adjacent actuators or stray fields while also minimizing attraction between the permanent magnet () and the shield ().

Actuation mechanism, optical apparatus and lithography apparatus

A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.

Lithographic apparatus comprising an actuator, and method for protecting such actuator

An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.

Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices

A support for a movable element includes a stator element, a gravity compensator field inducing element mounted on the stator element, the gravity compensator field inducing element configured to apply a translational force to the movable element by controlling a magnetic field in a gap between the stator element and the movable element, and a plurality of torque compensator field inducing elements mounted on the stator element, the torque compensator field inducing elements configured to apply a torque to the movable element by controlling a magnetic field in the gap between the stator element and the movable element, the torque being about a first axis substantially perpendicular to the direction of the translational force applied by the gravity compensator field inducing element.

Support for a movable element and lithography apparatus

An EUV optical apparatus includes a number of adjustable mirrors () on mirror bodies (). Each mirror body is supported on an actuator () comprising a moving part () and a fixed casing part (). The actuator provides a resilient support () for the mirror body so that it is tiltable with two degrees relative to the casing. An electromagnetic motor (-) applies first part, under the influence of an applied motive force, the resilient mounting being arranged to provide a biasing force that resists said motive force. A magnetic coupling () is arranged between the moving and fixed parts so as to provide a counter-biasing force. The counter-biasing force partly opposes said biasing force and thereby reduces the motive force required to effect a given displacement. The actuator can thus be made with reduced size, weight and heat dissipation.

An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.

Lithographic apparatus and device manufacturing method

A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.

Lithographic apparatus, method of deforming a substrate table and device manufacturing method

A lithographic apparatus includes an actuator for producing a force in a first direction between a first and a second part including a first magnet assembly and a second magnet assembly each attached opposite to each other to the first part of the apparatus, the first magnet assembly including a first main magnet system and a first outer subsidiary magnet system, and the second magnet assembly including a second main magnet system and a second outer subsidiary magnet system, the first and second main magnet system defining a space between them in a second direction perpendicular to the first direction. The actuator includes a coil attached to the second part. The distance between the first outer subsidiary magnet system and the second outer subsidiary magnet system in the second direction is substantially zero.

Lithographic apparatus and lorentz actuator

A motor includes a stator including a plurality of stator poles arranged in a repetitive arrangement with a first pitch, the stator poles facing a first side of a plane of movement, and a mover including a plurality of mover poles arranged in a repetitive arrangement with a second pitch, the mover poles facing a second, opposite side of the plane of movement. The poles of the stator and/or the mover are provided with a winding to alter a magnetic field in the respective ones of the stator poles and the mover poles in response to an electric current through the respective winding. At least one of the stator and the mover includes a permanent magnet for generating a magnetic field extending from the permanent magnet via at least one respective pole of the stator and the mover to the other one of the stator and the mover and back.

Planar motor and lithographic apparatus comprising such planar motor

A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator.

Lithographic apparatus comprising a substrate table and a surface substrate actuator

A variable reluctance device includes first and second magnetic members, a coil, a measurement coil, and a control unit. The first and second magnetic members are displaceable relative to each other to provide a magnetic circuit having a variable reluctance. The coil for, in use, receiving a current for generating a magnetic flux through the magnetic circuit. The measurement coil for generating a measurement signal representative of the magnetic flux through the magnetic circuit, whereby the measurement coil is arranged to substantially enclose the magnetic flux through the magnetic circuit. The control unit arranged to receive the flux signal at an input terminal and, in response, provide a control signal based on the measurement signal at an output terminal for controlling an amplitude of the current or a force of a further device. The device can e.g., be applied in a stage apparatus or a lithographic apparatus.

Variable reluctance device, stage apparatus, lithographic apparatus and device manufacturing method

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Eindhoven, Netherlands

Sven Antoin Johan Hol