The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2016
Filed:
Dec. 05, 2012
Asml Netherlands B.v., Veldhoven, NL;
Hans Butler, Best, NL;
Arno Jan Bleeker, Westerhoven, NL;
Pieter Renaat Maria Hennus, Peer, BE;
Martinus Hendricus Henricus Hoeks, Breugel, NL;
Sven Antoin Johan Hol, Eindhoven, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
Bernardus Antonius Slaghekke, Veldhoven, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Theodorus Petrus Maria Cadee, Vlierden, NL;
Ruud Antonius Catharina Maria Beerens, Roggel, NL;
Olof Martinus Josephus Fischer, Veldhoven, NL;
Wilhelmus Henricus Theodorus Maria Aangenent, 's-Hertogenbosch, NL;
Niels Johannes Maria Bosch, Venlo, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.