The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2016
Filed:
Jun. 12, 2012
Yang-shan Huang, Veldhoven, NL;
Hans Butler, Best, NL;
Jan Van Eijk, Eindhoven, NL;
Sven Antoin Johan Hol, Eindhoven, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Bastiaan Lambertus Wilhelmus Marinus Van DE Ven, Rosmalen, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Theodorus Petrus Maria Cadee, Asten, NL;
Robbert Edgar Van Leeuwen, Eindhoven, NL;
Yang-Shan Huang, Veldhoven, NL;
Hans Butler, Best, NL;
Jan Van Eijk, Eindhoven, NL;
Sven Antoin Johan Hol, Eindhoven, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Rosmalen, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Theodorus Petrus Maria Cadee, Asten, NL;
Robbert Edgar Van Leeuwen, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.