Oirschot, Netherlands

Engelbertus Antonius Fransiscus Van Der Pasch

This inventor holds 88 USPTO granted patents and 2 published patent applications and 8 EPO patents, primarily in Lithographic Apparatus (CPC class G03F7-70775). Top assignees: Asml Netherlands B.v., Carl Zeiss Smt Gmbh. Active years: 2006-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Engelbertus Antonius Fransiscus Van Der Pasch. Retrieved from https://idiyas.com/inventor/engelbertus-antonius-fransiscus-van-der-pasch

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 88 

% Patents Active = 77.3

 

Average Co-Inventor Count = 3.7

ph-index = 11

Forward Citations = 930(Granted Patents)

Forward Citations (Not Self Cited) = 855(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Veldhoven, NL (2022)
  • Oirschot, NL (2006 - 2024)

Company Filing History:


Years Active: 2006-2026

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Areas of Expertise:
Lithographic Apparatus
Metrology Techniques
Optical Positioning
Imprint Lithography
Interferometer System
Calibration Procedures
Stage System
Position Measurement
Cyclic Error Measurements
Device Manufacturing
Substrate Positioning
Optical Device
88 patents (USPTO):Explore Patents

Title: Engelbertus Antonius Fransiscus Van Der Pasch: Pushing Boundaries and Revolutionizing Innovation

Introduction:

Engelbertus Antonius Fransiscus Van Der Pasch, a distinguished inventor hailing from Oirschot, NL, has carved a remarkable career path as a relentless seeker of groundbreaking solutions. With an extraordinary repertoire comprising 83 patents, Van Der Pasch's contributions have left an indelible mark on the world of innovation and technology. This article delves into his latest patents, highlights his stellar career achievements, explores his notable collaborations, and celebrates his influential journey.

Latest Patents:

Van Der Pasch's recent patents showcase his expertise and dedication to developing cutting-edge solutions. Among these patents are the Interferometer System, Method of Determining a Mode Hop of a Laser Source of an Interferometer System, Method of Determining a Position of a Movable Object, and the Lithographic Apparatus. The Interferometer System encompasses an optical system that effectively splits a radiation beam from a laser source into two beams, manipulating their path lengths and recombining them to derive essential phase shift data. These advancements have revolutionized interferometry, enabling more accurate measurements and improved precision.

Career Highlights:

Throughout his illustrious career, Van Der Pasch has consistently demonstrated exceptional creativity and technical proficiency. His extensive patent portfolio is a testament to his ceaseless pursuit of innovation. Van Der Pasch has made significant contributions to renowned technology companies, including Asml Netherlands B.V. and Carl Zeiss SMT GmbH, where he played a pivotal role in the development of groundbreaking technologies.

Collaborations:

Van Der Pasch's accomplishments have also been fortified by collaborations with brilliant minds in his field. Notably, he has worked alongside esteemed individuals such as Emiel Jozef Melanie Eussen and Erik Roelof Loopstra, who have contributed their own unparalleled expertise to their collective pursuits. These collaborations have fostered a vibrant exchange of ideas and propelled their respective fields forward.

Conclusion:

Engelbertus Antonius Fransiscus Van Der Pasch is a true trailblazer, consistently pushing the boundaries of innovation through groundbreaking inventions and patents. His remarkable technical expertise and unwavering dedication to his craft have brought about significant advancements in the fields of interferometry and lithography. As we look to the future, it is no doubt that Van Der Pasch will continue to leave an indelible mark on the world of inventions and patents, inspiring generations of innovators to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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