The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 2022

Filed:

Apr. 03, 2020
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:
Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); H01J 37/24 (2006.01); H01J 37/317 (2006.01); H01J 37/244 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); H01J 37/244 (2013.01); H01J 37/3174 (2013.01); H01J 2237/20214 (2013.01); H01J 2237/20235 (2013.01); H01J 2237/20292 (2013.01); H01J 2237/24578 (2013.01);
Abstract

A stage apparatus for an e-beam inspection apparatus comprising: an object table () comprising an supporting surface, the object table configured to support a substrate () on the supporting surface; a positioning device () configured to a position the object table; a position measurement system () comprising a position sensor (-) configured to measure a height position of the object table parallel to a first axis, the first axis being substantially perpendicular to the supporting surface, the position sensor comprising an interferometer measurement system having an interferometer sensor (), wherein a measurement beam () of the interferometer sensor is configured to irradiate a reflective surface () of the object table in a measurement direction, the measurement direction having a first component parallel to the first axis and a second component parallel to a second axis, the second axis being substantially perpendicular to the first axis.


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