The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2020

Filed:

Nov. 16, 2017
Applicant:

Asml Netherlands B. V., Veldhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 5/32 (2006.01); G03F 9/00 (2006.01); G02B 27/42 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70141 (2013.01); G02B 5/32 (2013.01); G02B 27/4222 (2013.01); G03F 7/7015 (2013.01); G03F 7/7055 (2013.01); G03F 7/70058 (2013.01); G03F 7/7085 (2013.01); G03F 7/70158 (2013.01); G03F 9/7003 (2013.01); G03F 7/70033 (2013.01);
Abstract

An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.


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