The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2015
Filed:
May. 22, 2012
Hans Butler, Best, NL;
Jan Van Eijk, Eindhoven, NL;
Sven Antoin Johan Hol, Eindhoven, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Yang-shan Huang, Veldhoven, NL;
Hans Butler, Best, NL;
Jan Van Eijk, Eindhoven, NL;
Sven Antoin Johan Hol, Eindhoven, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Yang-Shan Huang, Veldhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator.