The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2023
Filed:
Aug. 12, 2020
Asml Netherlands B.v., Veldhoven, NL;
Marcel Koenraad Marie Baggen, Veldhoven, NL;
Peter Paul Hempenius, Veldhoven, NL;
Maarten Frans Janus Kremers, Veldhoven, NL;
Robertus Jacobus Theodorus Van Kempen, Veldhoven, NL;
Sven Antoin Johan Hol, San Jose, CA (US);
Henricus Martinus Johannes Van De Groes, Veldhoven, NL;
Johannes Hubertus Antonius Van De Rijdt, Veldhoven, NL;
Niels Johannes Maria Bosch, Veldhoven, NL;
Maarten Hartger Kimman, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.