IDiyas

For the Inventor, By the Inventor

Nuenen, Netherlands

Peter Paul Hempenius

USPTO Granted Patents = 15 

Average Co-Inventor Count = 5.6

ph-index = 3

Forward Citations = 29(Granted Patents)


Location History:

  • Luyksgestel, NL (2011)
  • Nuenen, NL (2010 - 2023)
  • Veldhoven, NL (2022 - 2023)

Company Filing History:

goldMedal15 out of 4,883 
 
Asml Netherlands B.v.
 patents

Years Active: 2010-2023

Loading Chart...
15 patents (USPTO):
1. 11798777 - Charged particle beam apparatus, and systems and methods for operating the apparatus (2023-10-24),
2. 11764030 - Stage apparatus suitable for electron beam inspection apparatus (2023-09-19),
3. 11621142 - Substrate positioning device and electron beam inspection tool (2023-04-04),
4. 11315752 - E-beam apparatus (2022-04-26),
5. 11302512 - Electron beam inspection apparatus stage positioning (2022-04-12),
6. 10867770 - E-beam apparatus (2020-12-15),
7. 10809634 - Stage system and metrology tool (2020-10-20),
8. 10191396 - Lithographic apparatus, object positioning system and device manufacturing method (2019-01-29),
9. 9946172 - System for positioning an object in lithography (2018-04-17),
10. 9378722 - Lithographic apparatus with actuator to compensate acoustic vibration (2016-06-28),
11. 8928860 - Lithographic apparatus having a chuck with a visco-elastic damping layer (2015-01-06),
12. 8310651 - Lithographic apparatus, method and device manufacturing method (2012-11-13),
13. 7969550 - Lithographic apparatus and device manufacturing method (2011-06-28),
14. 7884919 - Lithographic apparatus and device manufacturing method (2011-02-08),
15. 7742149 - Stage system and lithographic apparatus comprising such a stage system (2010-06-22),

Sure, I can help you with that. Let's start with the article about inventor Peter Paul Hempenius.

Title: Unveiling the Innovations of Peter Paul Hempenius: A Pioneer in Charged Particle Beam Technology

Introduction:

Peter Paul Hempenius, a renowned inventor hailing from Nuenen, NL, has made significant contributions to the field of charged particle beam technology. With an impressive portfolio of 15 patents, Hempenius continues to push the boundaries of innovation in his domain.

Latest Patents:

Among his latest patents is the "Charged Particle Beam Apparatus," which showcases his expertise in designing systems for operating beamlet-forming units. This apparatus enables precise scanning of beamlets on a sample, allowing for enhanced imaging capabilities. Another notable innovation is the "Stage Apparatus Suitable for Electron Beam Inspection Apparatus," which features a sophisticated object support system with damped and rigid connections for optimal positioning.

Career Highlights:

Peter Paul Hempenius thrives in his role at ASML Netherlands B.V., a leading technology company at the forefront of semiconductor manufacturing. His tenure at ASML has been marked by a series of groundbreaking inventions that have revolutionized charged particle beam technology and inspection systems.

Collaborations:

In his collaborative endeavors, Hempenius has worked closely with esteemed colleagues such as Youssef Karel Maria De Vos and Marcel Koenraad Marie Baggen. Together, they have synergized their expertise to drive innovation and bring cutting-edge solutions to fruition.

Conclusion:

In conclusion, Peter Paul Hempenius stands as a testament to the power of innovation and perseverance in the realm of charged particle beam technology. His patented inventions reflect his unwavering commitment to advancing scientific endeavors and shaping the future of electron beam inspection systems. Stay tuned for more groundbreaking innovations from this visionary inventor.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…