The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2018
Filed:
Nov. 14, 2014
Asml Netherlands B.v., Veldhoven, NL;
Peter Paul Hempenius, Nuenen, NL;
Martijn Houben, ′s-Hertogenbosch, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Robertus Mathijs Gerardus Rijs, Eindhoven, NL;
Paul Corné Henri De Wit, Eindhoven, NL;
Stijn Willem Boere, Veldhoven, NL;
Youssef Karel Maria De Vos, Lille, BE;
Frits Van Der Meulen, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; and a conduit provided with a fluid, wherein the conduit is arranged on or in the object in a pattern, and wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, the acceleration pressure profile not matching with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.