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For the Inventor, By the Inventor

Eindhoven, Netherlands

Frits Van Der Meulen

This inventor holds 47 USPTO granted patents and 1 published patent application and 13 EPO patents, primarily in Lithography Technology. Top assignees: Asml Netherlands B.v., Asml Holding N.v., Asml Holdings N.v.. Active years: 2006-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Frits Van Der Meulen. Retrieved from https://idiyas.com/inventor/frits-van-der-meulen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 47 

% Patents Active = 68.1

 

Average Co-Inventor Count = 10.2

ph-index = 9

Forward Citations = 353(Granted Patents)


Location History:

  • Einhoven, NL (2014)
  • Breda, NL (2006 - 2019)
  • Eindhoven, NL (2008 - 2023)

Company Filing History:

goldMedal47 out of 5,075 
 
Asml Netherlands B.v.
 patents
silverMedal14 out of 630 
 
Asml Holding N.v.
 patents
bronzeMedal1 out of 23 
 
Asml Holdings N.v.
 patents
where one patent can have more than one assignee

Years Active: 2006-2026

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Areas of Expertise:
Lithographic Apparatus
Mask Assembly
Object Positioning System
Pellicle Attachment
Cooling Hood
Temperature Control
Substrate Support
Device Manufacturing Method
Stage System
Immersion Projection
Gas Mixing
Shared Compliance
47 patents (USPTO):Explore Patents
1. 12619165 - Electrostatic holder, object table and lithographic apparatus (2026-05-05),
2. 11681233 - Gas mixing for fast temperature control of a cooling hood (2023-06-20),
3. 11009803 - Mask assembly (2021-05-18),
4. 11003098 - Pellicle attachment apparatus (2021-05-11),
5. 10969701 - Pellicle attachment apparatus (2021-04-06),
6. 10747127 - Lithographic apparatus (2020-08-18),
7. 10705439 - Lithographic apparatus and device manufacturing method (2020-07-07),
8. 10620552 - Stage system, lithographic apparatus and device manufacturing method (2020-04-14),
9. 10599054 - Lithographic apparatus and device manufacturing method (2020-03-24),
10. 10558129 - Mask assembly (2020-02-11),
11. 10539886 - Pellicle attachment apparatus (2020-01-21),
12. 10466595 - Lithographic apparatus and device manufacturing method (2019-11-05),
13. 10394140 - Lithographic apparatus (2019-08-27),
14. 10331047 - Lithographic apparatus and device manufacturing method (2019-06-25),
15. 10191396 - Lithographic apparatus, object positioning system and device manufacturing method (2019-01-29),

Title: Brilliant Innovator: Frits Van Der Meulen

Introduction:

Frits Van Der Meulen is a prolific inventor based in Eindhoven, Netherlands, with an impressive portfolio of 46 patents. His groundbreaking work in the field of technology has cemented his reputation as a visionary in the industry.

Latest Patents:

One of Frits Van Der Meulen's recent patents includes a system for gas mixing to enable fast temperature control of a cooling hood. This system allows for precise adjustments in thermal conditions of physical components, enhancing efficiency and performance. Another notable patent is a mask assembly designed for lithographic processes, showcasing his expertise in precision engineering.

Career Highlights:

Frits Van Der Meulen has made significant contributions during his tenure at renowned companies such as ASML Netherlands B.V. and ASML Holding N.V. His innovative solutions have pushed the boundaries of technology, revolutionizing the semiconductor industry and beyond.

Collaborations:

Throughout his career, Frits Van Der Meulen has collaborated with talented individuals such as Henrikus Herman Marie Cox and Christiaan Alexander Hoogendam. Together, they have worked on cutting-edge projects that have paved the way for future advancements in technology.

Conclusion:

In conclusion, Frits Van Der Meulen stands out as a trailblazing inventor whose creativity and expertise have led to numerous groundbreaking patents. His remarkable career is a testament to his dedication to innovation and his ongoing commitment to shaping the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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