The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2023
Filed:
Sep. 26, 2019
Asml Netherlands B.v., Veldhoven, NL;
Joost De Hoogh, Eindhoven, NL;
Alain Louis Claude Leroux, Eindhoven, NL;
Alexander Marinus Arnoldus Huijberts, Veghel, NL;
Christiaan Louis Valentin, Eindhoven, NL;
Robert Coenraad Wit, Eindhoven, NL;
Dries Vaast Paul Hemschoote, Vosselaar, BE;
Frits Van Der Meulen, Eindhoven, NL;
Johannes Franciscus Martinus Van Santvoort, Eindhoven, NL;
Radu Donose, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A system having a sub-system that is configured to change a thermal condition of a physical component from a set-point to a new set-point, wherein the sub-system includes: a mixer operative to receive a first conditioning fluid having a first temperature and a second conditioning fluid having a second temperature different from the first temperature, and operative to supply to the physical component a mix of the first conditioning fluid and the second conditioning fluid; and a controller configured to control the mixer in dependence on the new set-point. Also a method of operating a lithographic apparatus as well as a device manufactured using the system described herein or according to methods described herein.