The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2020
Filed:
Nov. 16, 2015
Asml Netherlands B.v., Veldhoven, NL;
Matthias Kruizinga, Herten, NL;
Maarten Mathijs Marinus Jansen, Eindhoven, NL;
Jorge Manuel Azeredo Lima, Veldhoven, NL;
Erik Willem Bogaart, Someren, NL;
Derk Servatius Gertruda Brouns, Herentals, BE;
Marc Bruijn, Eindhoven, NL;
Richard Joseph Bruls, Eindhoven, NL;
Jeroen Dekkers, Eindhoven, NL;
Paul Janssen, Eindhoven, NL;
Mohammad Reza Kamali, Eindhoven, NL;
Ronald Harm Gunther Kramer, Hooge Mierde, NL;
Robert Gabriël Maria Lansbergen, Schiedam, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Matthew Lipson, Wilton, CT (US);
Erik Roelof Loopstra, Eindhoven, NL;
Joseph H. Lyons, Wilton, CT (US);
Stephen Roux, New Fairfield, CT (US);
Gerrit Van Den Bosch, Geldermalsen, NL;
Sander Van Den Heijkant, Valkenswaard, NL;
Sandra Van Der Graaf, 's-Hertogenbosch, NL;
Frits Van Der Meulen, Eindhoven, NL;
Jérôme François Sylvain Virgile Van Loo, Tilburg, NL;
Beatrijs Louise Marie-Joseph Katrien Verbrugge, Kasterlee, BE;
ASML Netherlands B.V., Veldhoven, NL;
ASML Holding N.V., Veldhoven, NL;
Abstract
A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.