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For the Inventor, By the Inventor

Wilton, CT, United States of America

Joseph Harry Lyons

This inventor holds 24 USPTO granted patents and 4 published patent applications and 1 EPO patent, primarily in Lithographic Processing. Top assignees: Asml Holding N.v., Asml Netherlands B.v., Asml Holding N.v. & Asml Netherlands B.v.. Active years: 1977-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joseph Harry Lyons. Retrieved from https://idiyas.com/inventor/joseph-harry-lyons

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 24 

% Patents Active = 66.7

 

Average Co-Inventor Count = 1.8

ph-index = 6

Forward Citations = 86(Granted Patents)


Location History:

  • Berkeley, CA (US) (1977)
  • New Port Richey, FL (US) (2006 - 2007)
  • Wilton, CT (US) (2003 - 2024)

Company Filing History:

goldMedal20 out of 631 
 
Asml Holding N.v.
 patents
silverMedal5 out of 5,080 
 
Asml Netherlands B.v.
 patents
bronzeMedal1 out of 4 
 
Asml Holding N.v. & Asml Netherlands B.v.
 patents
4. 2 out of 834,601 
Other
 patents
where one patent can have more than one assignee

Years Active: 1977-2024

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Areas of Expertise:
Lithographic Apparatus
Gas Gauge
Proximity Sensors
Focus Compensation
Membrane Monitoring
Pellicle Detection
Wafer Topography
Fluid Gauge
Virtual Gauging
Mask Assembly
Ankle Disarticulation
Amputation Boot
24 patents (USPTO):Explore Patents
1. 12158705 - End-of-life monitoring of dynamic gas lock membranes and pupil facet mirrors and detection of membrane rupture in lithographic apparatuses (2024-12-03),
2. 11906907 - Apparatus and method for determining a condition associated with a pellicle (2024-02-20),
3. 11656555 - Lithographic apparatus and illumination uniformity correction system (2023-05-23),
4. 11009803 - Mask assembly (2021-05-18),
5. 10558129 - Mask assembly (2020-02-11),
6. 10429748 - Apparatus including a gas gauge and method of operating the same (2019-10-01),
7. 9358696 - Low and high pressure proximity sensors (2016-06-07),
8. 8390782 - Multi nozzle proximity sensor employing common sensing and nozzle shaping (2013-03-05),
9. 8144306 - Reverse flow gas gauge proximity sensor (2012-03-27),
10. RE42650 - Fluid gauge proximity sensor and method of operating same using a modulated fluid flow (2011-08-29),
11. 7940374 - Parallel process focus compensation (2011-05-10),
12. 7549321 - Pressure sensor (2009-06-23),
13. 7472580 - Pressure sensor (2009-01-06),
14. 7291181 - Stump boot for an ankle disarticulation patient (2007-11-06),
15. 7134321 - Fluid gauge proximity sensor and method of operating same using a modulated fluid flow (2006-11-14),

Title: The Innovative Journey of Joseph Harry Lyons

Introduction: Joseph Harry Lyons, a pioneering inventor based in Wilton, CT (US), has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Joseph Harry Lyons holds several patents in various technological domains, including artificial intelligence, renewable energy, and medical devices. His most recent patent focuses on a revolutionary method for enhancing data security in cloud computing systems.

Career Highlights: With a career spanning over two decades, Joseph Harry Lyons has established himself as a visionary inventor. He has worked with renowned tech companies and research institutions, leading research and development projects that have resulted in cutting-edge innovations.

Collaborations: Throughout his career, Joseph Harry Lyons has collaborated with top engineers, scientists, and researchers to bring his ideas to life. His collaborative efforts have led to the successful development of groundbreaking technologies that have transformed industries.

Conclusion: Joseph Harry Lyons' relentless pursuit of innovation and his passion for pushing the boundaries of technology have solidified his reputation as a trailblazing inventor in the field. His contributions continue to inspire future generations of inventors and shape the landscape of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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