Asml Holding N.v.

Asml Netherlands B.v.

Other

Asml Holding N.v. & Asml Netherlands B.v.

Joseph Harry Lyons

Daniel Nicholas Galburt

Derk Servatius Gertruda Brouns

James Hamilton Walsh

Earl William Ebert

Erik Roelof Loopstra

Martinus Hendrikus Antonius Leenders

Frits Van Der Meulen

Stephen Roux

Richard Joseph Bruls

Paul Janssen

Matthew Lipson

Peter Conrad Kochersperger

George Brown

Matthias Kruizinga

Robert Gabriël Maria Lansbergen

Jeroen Dekkers

Erik Willem Bogaart

Beatrijs Louise Marie-Joseph Katrien Verbrugge

Gerrit Van Den Bosch

Maarten Mathijs Marinus Jansen

Sandra Van Der Graaf

Jérôme François Sylvain Virgile Van Loo

Jorge Manuel Azeredo Lima

Marc Bruijn

Ronald Harm Gunther Kramer

Mohammad Reza Kamali

Rajan Mali

Joseph G Whelan

Sander Van Den Heijkant

Marcus Adrianus Van De Kerkhof

Theodorus Marinus Modderman

Aage Bendiksen

Reinier Theodorus Martinus Jilisen

Zhuangxiong Huang

Manish Ranjan

Todd R Downey

Martinus Cornelis Reijnen

Joshua Adams

Richard Jacobs

Andrew Judge

Kalyan Kumar Mankala

Erik Johan Arlemark

Tian Gang

Janardan Nath

Ping Zhou

Nicolae Marian Ungureanu

Nicholas Stephen Apone

Alexander Harris Ledbetter

Ozer Unluhisarcikli

Jimi Hendriks

Veera Venkata Narasimha Narendra Phani Kottapalli

Xugang Xiong

Embodiments herein describe methods, devices, and systems for rupture detection and end-of-life monitoring of dynamic gas lock (DGL) membranes and pupil facet mirrors in lithographic apparatuses. A method for detecting rupture of a dynamic gas lock membrane in a lithographic apparatus includes illuminating the dynamic gas lock membrane with a measurement beam using a radiation source, in which the dynamic gas lock membrane is arranged between a wafer and projection optics of the lithography apparatus, and determining whether any radiation from the measurement beam is reflected from the dynamic gas lock membrane by using reflection collection optics, in which the reflection collection optics are arranged above the dynamic gas lock membrane. A rupture in the dynamic gas lock membrane is detected if no radiation is reflected from the dynamic gas lock membrane. If radiation is reflected from the dynamic gas lock membrane, the dynamic gas lock membrane is not ruptured.

End-of-life monitoring of dynamic gas lock membranes and pupil facet mirrors and detection of membrane rupture in lithographic apparatuses

An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.

Apparatus and method for determining a condition associated with a pellicle

An illumination adjustment apparatus, to adjust a cross slot illumination of a beam in a lithographic apparatus, includes a plurality of fingers to adjust the cross slot illumination to conform to a selected intensity profile. Each finger has a distal edge that includes at least two segments. The two segments form an indentation of the distal edge.

Lithographic apparatus and illumination uniformity correction system

A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Mask assembly

An apparatus, such as a lithographic apparatus, has a metrology frame that has a reference frame mounted thereon that includes a reference surface. A gas gauge is movable relative to the reference frame, metrology frame, and a measured surface. A reference nozzle in the gas gauge provides gas to the reference surface and a measurement nozzle provides gas to the measured surface. A microelectromechanical (MEM) sensor may be used with the gas gauge to sense a difference in backpressure from each of the reference nozzle and the measurement nozzle. Optionally, multiple gas gauges are positioned in an array, which may extend in a direction that is substantially parallel to a plane of the measured surface. The gauges may be fluidly connected to a reference nozzle of the gas gauge. A channel may distribute gas across the array.

Apparatus including a gas gauge and method of operating the same

A fluid proximity sensor for surface measurements having a measurement chamber () with a measurement nozzle (), a reference chamber () with a reference nozzle (), and a diaphragm () forming an interface between the reference chamber and the measurement chamber. A shroud () that encloses the measurement nozzle and reference nozzle provides a peripheral gap () between the shroud and a work surface () being measured. By connecting either a partial vacuum supply or a partial fluid supply to the shroud, the internal shroud pressure can be raised or lowered and thus the gain-frequency operating regime of the proximity sensor optimized. Movement of the diaphragm in response to differential pressure changes can be sensed by optical, capacitive or inductive means ().

Low and high pressure proximity sensors

A fluid proximity sensor having one or more measurement nozzles and a reference nozzle coupled to a common chamber. Diaphragms coupled to the measurement nozzles can be sensed by optical, capacitive or inductive means so as to detect changes in pressure. In addition, the number of pressure detectors can be minimized through the use of control valves to selectively couple the nozzles to the detectors, while maintaining the required high level of topographic sensitivity. Further, the measurement nozzle dimensions can be adjusted to optimize proximity measurements in response to accuracy, speed and similar requirements.

Multi nozzle proximity sensor employing common sensing and nozzle shaping

A gas gauge proximity sensor supplying gas in a reverse flow direction from the injection chamber to the measurement chamber. Supplying gas in a reverse flow direction enables the transient behavior in the sensor to more rapidly stabilize, with a resulting increase in bandwidth. Optionally, a scavenger chamber can be used to remove the excess gas by locating a scavenger aperture of the scavenger chamber in close proximity to the exit aperture of the injection chamber. A bridge proximity sensor can be used with a reference chamber to receive gas flow from a location close to the exit aperture of the injection chamber in order to reduce common mode errors.

Reverse flow gas gauge proximity sensor

A system and method that use a fluid gauge proximity sensor. A source of modulated unidirectional or alternating fluid flow travels along at least one path having a nozzle and a flow or pressure sensor. The fluid exists at a gap between the nozzle and a target. The sensor outputs an amplitude modulated signal that varies according to a size of the gap. The amplitude modulated signal is processed either digitally or in analog devices, which can include being filtered (e.g., band pass, band limited, high pass, etc. filter) to include the modulated frequency and sufficient bandwidth on either side of that frequency and/or being demodulated using a demodulator operating at the acoustical driver modulation frequency. Using this system and method can result in only ambient acoustical energy in a desired frequency range of the device actually having the opportunity to interfere with the device operation. This can lower the devices overall sensitivity to external acoustical noise and sensor offset.

Fluid gauge proximity sensor and method of operating same using a modulated fluid flow

Disclosed are systems, methods, and computer program products for parallel process focus compensation. Such methods may include three steps. First, a first sensor senses a top surface of a wafer to provide first-sensor data which defines a first topographic map of the first surface of the wafer. The first sensor may be, for example, an air gauge. Second, a second sensor senses the top surface of the wafer in parallel with the first sensor to provide second-sensor data which defines a second topographic map of the first surface of the wafer. The second sensor may be, for example, an optical sensor or a capacitance sensor. Third, a calibration module calibrates focus-positioning parameters of an exposure system based on the first- and second-sensor data. The calibration module may be embodied in hardware, software, firmware, or a combination thereof.

Parallel process focus compensation

A choked-flow orifice gas gauge proximity sensor for sensing a difference between a reference surface standoff and a measurement surface standoff is disclosed. Unlike existing proximity sensors, the gas gauge proximity sensor of the present invention replaces the use of a mass flow controller with a choked flow orifice. The use of a choked flow orifice provides for reduced equipment cost and improved system reliability. A gas supply forces gas into the proximity sensor. The gas is forced through the choked flow orifice to achieve sonic conditions at which time the mass flow rate becomes largely independent of pressure variations. The flow of gas proceeds from the choked flow orifice into a sensor channel system. A mass flow sensor within the sensor channel system monitors flow rates to detect measurement standoffs that can be used to initiate a control action.

Pressure sensor

A vacuum-driven gas gauge proximity sensor for sensing a difference between a reference surface standoff and a measurement surface standoff is disclosed. Unlike existing proximity sensors, the vacuum-driven gas gauge proximity sensor uses a vacuum to reverse the traditional flow of gas through a proximity sensor, such that gas flows inward across measurement and reference standoffs through measurement and reference nozzles. The conditioned ambient gas that is vacuumed into the reference and measurement nozzles flows through reference and measurement channels that are coupled at a junction into a single channel. The single channel is coupled to the vacuum that is used to evacuate the conditioned ambient gas through the proximity sensor. A bridge channel couples the reference and measurement channels. A mass flow sensor along the bridge channel monitors flow rates to detect measurement standoffs that can be used to initiate a control action. A pump-driven liquid flow proximity sensor is also disclosed.

A stump boot for use by an ankle disarticulation patient having a stump. The stump boot includes a sole, an inner casing, and an outer casing having a substantially rectangular cutout covered by a flexible member. The inner casing is custom molded to fit the stump and insertable within the outer casing. The sole is integrally attached to the outer casing and includes a foam inner sole, an outer sole having a non-skid grip material, a contoured wedge therebetween having an adjustable rubber build-up and a rounded bottom. A buckle and a strap are both integrally attached to the outer casing opposite one another. The strap has a securing fastener and a securing means and wraps over the flexible member and through the buckle for securing the stump within the stump boot.

Stump boot for an ankle disarticulation patient

Growing community of inventors

Wilton, CT, United States of America

Joseph Harry Lyons