Asml Netherlands B.v.

Asml Holding N.v.

Asml Holdings N.v.

Frits Van Der Meulen

Henrikus Herman Marie Cox

Christiaan Alexander Hoogendam

Jan-Gerard Cornelis Van Der Toorn

Sjoerd Nicolaas Lambertus Donders

Jeroen Johannes Sophia Maria Mertens

Nicolaas Ten Kate

Nicolaas Rudolf Kemper

Erik Roelof Loopstra

Martinus Hendrikus Antonius Leenders

Franciscus Johannes Herman Maria Teunissen

Herman Vogel

Johannes Petrus Maria Smeulers

Stefan Philip Christiaan Belfroid

Roelof Frederik De Graaf

Martinus Cornelis Maria Verhagen

Martijn Houkes

Joost Jeroen Ottens

Johannes Catharinus Hubertus Mulkens

Bob Streefkerk

Johannes Jacobus Matheus Baselmans

Joeri Lof

Alexander Straaijer

Klaus Simon

Antonius Theodorus Anna Maria Derksen

Bernardus Antonius Slaghekke

Edwin Augustinus Matheus Van Gompel

Gerardus Petrus Matthijs Van Nunen

Marco Polizzi

Paul Janssen

Derk Servatius Gertruda Brouns

Robert Gabriël Maria Lansbergen

Matthias Kruizinga

Jeroen Dekkers

Beatrijs Louise Marie-Joseph Katrien Verbrugge

Gerrit Van Den Bosch

Maarten Mathijs Marinus Jansen

Jérôme François Sylvain Virgile Van Loo

Hans Butler

Johannes Henricus Wilhelmus Jacobs

Paul Corné Henri De Wit

Hendrikus Herman Marie Cox

Angelo Cesar Peter De Klerk

Silvester Matheus Reijnders

Harmen Klaas Van Der Schoot

Stephen Roux

Richard Joseph Bruls

Matthew Lipson

Adrianus Hendrik Koevoets

Joseph Harry Lyons

Frederik Eduard De Jong

Jim Vincent Overkamp

Stoyan Nihtianov

Martinus Agnes Willem Cuijpers

Peter Paul Hempenius

Youssef Karel Maria De Vos

Minne Cuperus

Erik Willem Bogaart

Mark Johannes Hermanus Frencken

Christiaan Louis Valentin

Robertus Mathijs Gerardus Rijs

Jacobus Cornelis Gerardus Van Der Sanden

Stijn Willem Boere

Sandra Van Der Graaf

Alain Louis Claude Leroux

Arie Jeffrey Den Boef

Raymond Wilhelmus Louis Lafarre

Levinus Pieter Bakker

Koen Jacobus Johannes Maria Zaal

Theodorus Petrus Maria Cadee

Hernes Jacobs

Martijn Houben

Jozef Petrus Henricus Benschop

David Ferdinand Vles

Leon Martin Levasier

Marinus Aart Van Den Brink

Wilhelmus Franciscus Johannes Simons

Gosse Charles De Vries

Sander Catharina Reinier Derks

Tom Van Zutphen

Marcel Koenraad Marie Baggen

Marcel Hendrikus Maria Beems

Edwin Cornelis Kadijk

Peter Smits

Frank Auer

Peter Paul Steijaert

Gerardus Adrianus Antonius Maria Kusters

Koos Van Berkel

Pieter Renaat Maria Hennus

Johannes Wilhelmus De Klerk

Jan Cornelis Van Der Hoeven

Hendrikus Johannes Marinus Van Abeelen

Martin Frans Pierre Smeets

Peter Franciscus Wanten

Petrus Marinus Christianus Maria Van Den Biggelaar

Martijn Van Baren

Martinus Arnoldus Henricus Terken

Rob Jansen

Stan Henricus Van Der Meulen

Martinus Cornelis Reijnen

A system having a sub-system that is configured to change a thermal condition of a physical component from a set-point to a new set-point, wherein the sub-system includes: a mixer operative to receive a first conditioning fluid having a first temperature and a second conditioning fluid having a second temperature different from the first temperature, and operative to supply to the physical component a mix of the first conditioning fluid and the second conditioning fluid; and a controller configured to control the mixer in dependence on the new set-point. Also a method of operating a lithographic apparatus as well as a device manufactured using the system described herein or according to methods described herein.

Gas mixing for fast temperature control of a cooling hood

A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Mask assembly

Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Pellicle attachment apparatus

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Lithographic apparatus

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Lithographic apparatus and device manufacturing method

The invention pertains to a stage system, and to a lithographic apparatus and a method for manufacturing a device in which a stage system is used. In the stage system a positioning system is provided comprising an actuator adapted to position an object table. The actuator comprises a magnet assembly and a coil assembly. The magnet assembly comprises a first magnetic body and a second magnetic body, which are in use subjected to a internal magnetic force. The magnet assembly has a separate interface for connecting each magnetic body to the object table separately. The magnet assembly further comprises a spacer device, which holds the first and second magnetic body at a relative distance to each other in at least the direction of the internal magnetic force.

Stage system, lithographic apparatus and device manufacturing method

A mask assembly suitable for use in a lithographic process. The mask assembly comprises a patterning device, a sub-frame secured to the patterning device, a pellicle frame configured to support a pellicle and a mechanical attachment interface operable to allow attachment of the pellicle frame to the sub-frame and detachment of the pellicle frame from the sub-frame.

In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.

A temperature conditioning system for a lithographic apparatus. Temperature variations in an object cause object deformation which prevents the object being accurately positioned. Temperature condition systems use conduit systems, provided with fluid, in or on the object to control the temperature of the object to reduce object deformation. In this way, parts of the object can be more accurately positioned. However, acceleration of the object and the temperature conditioning system induces variation in pressure within the fluid inside the conduit system on or in the object, which may also cause object deformation. To provide an improved conduit system, the lithographic apparatus further includes a control system which is used to control the movement of the object based on measurements indicating pressure variation in the conduit.

Lithographic apparatus, object positioning system and device manufacturing method

A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; and a conduit provided with a fluid, wherein the conduit is arranged on or in the object in a pattern, and wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, the acceleration pressure profile not matching with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.

System for positioning an object in lithography

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Eindhoven, Netherlands

Frits Van Der Meulen