The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2019
Filed:
May. 21, 2015
Asml Netherlands B.v., Veldhoven, NL;
Paul Corné Henri De Wit, Eindhoven, NL;
Stijn Willem Boere, Eindhoven, NL;
Youssef Karel Maria De Vos, Lille, BE;
Peter Paul Hempenius, Nuenen, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Robertus Mathijs Gerardus Rijs, Sevenum, NL;
Frits Van Der Meulen, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A temperature conditioning system for a lithographic apparatus. Temperature variations in an object cause object deformation which prevents the object being accurately positioned. Temperature condition systems use conduit systems, provided with fluid, in or on the object to control the temperature of the object to reduce object deformation. In this way, parts of the object can be more accurately positioned. However, acceleration of the object and the temperature conditioning system induces variation in pressure within the fluid inside the conduit system on or in the object, which may also cause object deformation. To provide an improved conduit system, the lithographic apparatus further includes a control system which is used to control the movement of the object based on measurements indicating pressure variation in the conduit.