The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2019
Filed:
Jul. 28, 2017
Asml Netherlands B.v., Veldhoven, NL;
Hendrikus Herman Marie Cox, Eindhoven, NL;
Paul Corné Henri De Wit, Eindhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Adrianus Hendrik Koevoets, Mierlo, NL;
Jim Vincent Overkamp, Eindhoven, NL;
Frits Van Der Meulen, Eindhoven, NL;
Jacobus Cornelis Gerardus Van Der Sanden, Geldrop, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile