The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2020
Filed:
Nov. 16, 2015
Asml Netherlands B.v., Veldhoven, NL;
Frits Van Der Meulen, Eindhoven, NL;
Maarten Mathijs Marinus Jansen, Eindhoven, NL;
Jorge Manuel Azeredo Lima, Veldhoven, NL;
Derk Servatius Gertruda Brouns, Herentals, BE;
Marc Bruijn, Eindhoven, NL;
Jeroen Dekkers, Eindhoven, NL;
Paul Janssen, Eindhoven, NL;
Ronald Harm Gunther Kramer, Hooge Mierde, NL;
Matthias Kruizinga, Herten, NL;
Robert Gabriël Maria Lansbergen, Schiedam, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Gerrit Van Den Bosch, Geldermalsen, NL;
Jérôme François Sylvain Virgile Van Loo, Tilburg, NL;
Beatrijs Louise Marie-Joseph Katrien Verbrugge, Kasterlee, BE;
Angelo Cesar Peter De Klerk, Etten-Leur, NL;
Jacobus Maria Dings, Veldhoven, NL;
Maurice Leonardus Johannes Janssen, Munstergeleen, NL;
Roland Jacobus Johannes Kerstens, Noordhoek, NL;
Martinus Jozef Maria Kesters, Breda, NL;
Michel Loos, Oirschot, NL;
Geert Middel, Eindhoven, NL;
Silvester Matheus Reijnders, Asten, NL;
Frank Johannes Christiaan Theuerzeit, Grubbenvorst, NL;
Anne Johannes Wilhelmus Van Lievenoogen, Vught, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A mask assembly suitable for use in a lithographic process. The mask assembly comprises a patterning device, a sub-frame secured to the patterning device, a pellicle frame configured to support a pellicle and a mechanical attachment interface operable to allow attachment of the pellicle frame to the sub-frame and detachment of the pellicle frame from the sub-frame.