Noordhoek, Netherlands

Roland Jacobus Johannes Kerstens


 

Average Co-Inventor Count = 25.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2020-2021

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3 patents (USPTO):Explore Patents

Title: The Innovative Work of Roland Jacobus Johannes Kerstens in Lithographic Processes

Introduction: Roland Jacobus Johannes Kerstens, a talented inventor hailing from Noordhoek, Netherlands, has made significant contributions to the field of lithographic processes. With a total of three patents under his belt, Kerstens is known for his ingenuity and dedication to advancing technology in this specialized area.

Latest Patents: Among his three patents, Kerstens' most recent innovations include the "Pellicle Attachment Apparatus." This tooling for a mask assembly plays a crucial role in lithographic processes by enhancing the functionality of the mask assembly. The pellicle frame, with its releasably engageable attachment to the patterning device, showcases Kerstens' precision and attention to detail in his inventions.

Career Highlights: Kerstens is currently affiliated with ASML Netherlands B.V., a renowned company in the technology and semiconductor industry. His expertise and inventive spirit have been instrumental in the development of cutting-edge solutions for lithographic processes within the company.

Collaborations: In his professional journey, Kerstens has had the privilege of collaborating with esteemed colleagues such as Frits Van Der Meulen and Maarten Mathijs Marinus Jansen. Together, they have worked on innovative projects that have pushed the boundaries of lithographic technologies.

Conclusion: Roland Jacobus Johannes Kerstens' inventive prowess and commitment to excellence shine through in his groundbreaking patents and collaborations. His contributions to the field of lithographic processes have left a lasting impact on the industry, solidifying his reputation as a visionary inventor in the realm of technological advancements.

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