The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2022
Filed:
Mar. 04, 2020
Asml Netherlands B.v., Veldhoven, NL;
Marcel Koenraad Marie Baggen, Veldhoven, NL;
Antonius Henricus Arends, Veldhoven, NL;
Lucas Kuindersma, Veldhoven, NL;
Johannes Hubertus Antonius Van De Rijdt, Veldhoven, NL;
Peter Paul Hempenius, Veldhoven, NL;
Robertus Jacobus Theodorus Van Kempen, Veldhoven, NL;
Niels Johannes Maria Bosch, Veldhoven, NL;
Henricus Martinus Johannes Van De Groes, Veldhoven, NL;
Kuo-Feng Tseng, San Jose, CA (US);
Hans Butler, Veldhoven, NL;
Michael Johannes Christiaan Ronde, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.