The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2010
Filed:
May. 29, 2008
Applicants:
Youssef Karel Maria DE Vos, Lille, BE;
Ronald Casper Kunst, Geldrop, NL;
Patricia Vreugdewater, Eindhoven, NL;
Peter Paul Hempenius, Nuenen, NL;
Inventors:
Youssef Karel Maria De Vos, Lille, BE;
Ronald Casper Kunst, Geldrop, NL;
Patricia Vreugdewater, Eindhoven, NL;
Peter Paul Hempenius, Nuenen, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01);
U.S. Cl.
CPC ...
Abstract
A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators arranged to act on the stage, and an electric power supply configured to provide a current to the actuators, wherein the current is supplied to a coil associated with a first actuator of the actuators and to a coil associated with a second actuator of the actuators.