The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2012
Filed:
Jan. 30, 2009
Peter Paul Hempenius, Nuenen, NL;
Johan Hendrik Geerke, Eindhoven, NL;
Youssef Karel Maria DE Vos, Lille, BE;
Nicolaas Bernardus Roozen, Heeze, NL;
Erwin Antonius Henricus Fransiscus Van Den Boogaert, Someren-Eind, NL;
Alexander Cornelis Geerlings, Boxmeer, NL;
Peter Paul Hempenius, Nuenen, NL;
Johan Hendrik Geerke, Eindhoven, NL;
Youssef Karel Maria De Vos, Lille, BE;
Nicolaas Bernardus Roozen, Heeze, NL;
Erwin Antonius Henricus Fransiscus Van Den Boogaert, Someren-Eind, NL;
Alexander Cornelis Geerlings, Boxmeer, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In an embodiment, a lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a passive noise damper configured to dampen gas borne noise caused by movement of a movable part of the lithographic apparatus.