The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2011
Filed:
Feb. 09, 2006
Peter Hempenius, Luyksgestel, NL;
Marcel Koenraad Marie Baggen, Nuenen, NL;
Dirk-jan Bijvoet, Eindhoven, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Youssef Karel Maria DE Vos, Lille, BE;
Peter Hempenius, Luyksgestel, NL;
Marcel Koenraad Marie Baggen, Nuenen, NL;
Dirk-Jan Bijvoet, Eindhoven, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Youssef Karel Maria De Vos, Lille, BE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A device manufacturing method includes transferring a pattern from a patterning device onto a substrate. The method includes bringing the patterning device and the support together, and applying a substantially stationary force between the patterning device and the support to hold the patterning device. The patterning device is now excited by a substantially dynamic force to enable a micro slipping thereof. Then, the patterning device is aligned, and the pattern is transferred from the patterning device onto the substrate. The patterning device may be excited with an alternating acceleration. When the patterning device is excited, the patterning device is allowed to settle with respect to the support, thereby improving a friction therebetween to reduce a risk of slipping or local slipping of the patterning device.