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Eindhoven, Netherlands

Dirk-Jan Bijvoet

This inventor holds 15 USPTO granted patents and 1 published patent application and 2 EPO patents, primarily in Lithographic Apparatus. Top assignees: Asml Netherlands B.v., Amsl Netherlands B.v.. Active years: 2006-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dirk-Jan Bijvoet. Retrieved from https://idiyas.com/inventor/dirk-jan-bijvoet

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 15 

% Patents Active = 46.7

 

Average Co-Inventor Count = 2.0

ph-index = 3

Forward Citations = 26(Granted Patents)


Company Filing History:

goldMedal14 out of 5,080 
 
Asml Netherlands B.v.
 patents
silverMedal1 out of 3 
 
Amsl Netherlands B.v.
 patents

Years Active: 2006-2015

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Areas of Expertise:
Lithographic Apparatus
Chuck Damping
Substrate Support
Device Manufacturing
Servo Control
Thermal Loads
Patterning Device
Illumination System
Alignment Method
Open Cell Foam
Position Control
Compensation Methods
15 patents (USPTO):Explore Patents
1. 8928860 - Lithographic apparatus having a chuck with a visco-elastic damping layer (2015-01-06),
2. 8830442 - Servo control system, lithographic apparatus and control method (2014-09-09),
3. 8400617 - Lithographic apparatus having a substrate support with open cell plastic foam parts (2013-03-19),
4. 8384881 - Lithographic apparatus, stage apparatus and device manufacturing method (2013-02-26),
5. 8345265 - Lithographic apparatus and methods for compensating substrate unflatness, determining the effect of patterning device unflatness, and determining the effect of thermal loads on a patterning device (2013-01-01),
6. 8330940 - Lithographic apparatus, device manufacturing method and position control method (2012-12-11),
7. 7933000 - Device manufacturing method, method for holding a patterning device and lithographic apparatus including an applicator for applying molecules onto a clamp area of a patterning device (2011-04-26),
8. 7884919 - Lithographic apparatus and device manufacturing method (2011-02-08),
9. 7733463 - Lithographic apparatus and device manufacturing method (2010-06-08),
10. 7675607 - Lithographic apparatus and device manufacturing method (2010-03-09),
11. 7633600 - Lithographic apparatus and device manufacturing method (2009-12-15),
12. 7525636 - Lithographic apparatus and exposure method (2009-04-28),
13. 7459701 - Stage apparatus, lithographic apparatus and device manufacturing method (2008-12-02),
14. 7355677 - System and method for an improved illumination system in a lithographic apparatus (2008-04-08),
15. 7151591 - Alignment system, alignment method, and lithographic apparatus (2006-12-19),

Certainly! Here is an article about the inventor Dirk-Jan Bijvoet:

Title: Unveiling the Innovations of Dirk-Jan Bijvoet

Introduction: Dirk-Jan Bijvoet, an inventive mind hailing from Eindhoven, Netherlands, has made significant contributions in the field of lithography with a total of 15 patents to his credit.

Latest Patents:

1. *Lithographic Apparatus with Visco-Elastic Damping Layer:* Bijvoet's recent patent showcases a lithographic apparatus featuring a chuck with a visco-elastic damping layer. This innovation enhances the precision and stability of positioning objects within the apparatus.

2. *Servo Control System for Positional Accuracy:* Another notable patent by Bijvoet introduces a servo control system designed to ensure the accurate positioning of objects supported by a movable support. The system includes slip compensation features to mitigate any potential inaccuracies.

Career Highlights: Dirk-Jan Bijvoet has left an indelible mark through his tenure at prominent companies such as ASML Netherlands B.V. His expertise and inventive spirit have propelled advancements in lithographic technologies, garnering recognition within the industry.

Collaborations: Throughout his career, Bijvoet has collaborated with esteemed professionals like Marcel Koenraad Marie Baggen and Youssef Karel Maria De Vos. Together, they have synergized their talents to pioneer innovative solutions in the realm of lithography.

Conclusion: In conclusion, Dirk-Jan Bijvoet stands as a beacon of innovation, with a rich portfolio of patents that underscore his prowess in the field of lithography. His collaborative spirit and relentless pursuit of excellence continue to inspire advancements in the industry.

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Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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