The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2013
Filed:
Sep. 26, 2008
Joost Jeroen Ottens, Veldhoven, NL;
Dirk-jan Bijvoet, Eindhoven, NL;
Gerbrand Van Der Zouw, Eindhoven, NL;
Frederik Eduard DE Jong, Veldhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Dirk-Jan Bijvoet, Eindhoven, NL;
Gerbrand Van Der Zouw, Eindhoven, NL;
Frederik Eduard De Jong, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is described, the apparatus comprising an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a chuck constructed to hold the substrate table; a positioning device for, in use, displacing the chuck; a control unit configured to control the positioning device, wherein the control unit is arranged to drive the positioning device to excite the chuck by a substantially dynamic force to enable deformation of the chuck, prior to aligning the patterning device.