The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 08, 2010

Filed:

May. 05, 2006
Applicants:

Marcel Koenraad Marie Baggen, Nuenen, NL;

Dirk-jan Bijvoet, Eindhoven, NL;

Arjan Martin Van Der Wel, Eindhoven, NL;

Inventors:

Marcel Koenraad Marie Baggen, Nuenen, NL;

Dirk-Jan Bijvoet, Eindhoven, NL;

Arjan Martin Van Der Wel, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/62 (2006.01); G03B 27/64 (2006.01); G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A support constructed to support a patterning object, the patterning object being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, is disclosed, wherein the support comprises a plurality of structures having a plurality of local contact areas, respectively, on which the patterning object is disposed, in use, and a clamp configured to clamp the patterning object to the plurality of contact areas, wherein each structure is configured so that a local shear stiffness of each local contact area is substantially balanced with a local friction limit at each local contact area, respectively.


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