The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2010
Filed:
Jul. 14, 2006
Andre Bernardus Jeunink, Bergeyk, NL;
Marcel Koenraad Marie Baggen, Nuenen, NL;
Dirk-jan Bijvoet, Eindhoven, NL;
Thomas Josephus Maria Castenmiller, Eindhoven, NL;
Andre Bernardus Jeunink, Bergeyk, NL;
Marcel Koenraad Marie Baggen, Nuenen, NL;
Dirk-Jan Bijvoet, Eindhoven, NL;
Thomas Josephus Maria Castenmiller, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed having a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, the support including a support clamp constructed to clamp the patterning device to the support, and a bending mechanism constructed to apply a bending torque to the clamped patterning device, the bending mechanism comprising a force/torque actuator configured to act on the clamped patterning device without substantially reducing the clamping force exerted on the patterning device by the support clamp.