The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2020
Filed:
Dec. 17, 2019
Asml Netherlands B.v., Veldhoven, NL;
Andre Bernardus Jeunink, Bergeijk, NL;
Laurentius Johannes Adrianus Van Bokhoven, Veldhoven, NL;
Stan Henricus Van Der Meulen, Helmond, NL;
Yang-Shan Huang, Veldhoven, NL;
Federico La Torre, Eindhoven, NL;
Bearrach Moest, Eindhoven, NL;
Stefan Carolus Jacobus Antonius Keij, Breda, NL;
Enno Van Den Brink, Eindhoven, NL;
Christine Henriette Schouten, Veldhoven, NL;
Hoite Pieter Theodoor Tolsma, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.