The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2020
Filed:
Feb. 23, 2018
Asml Netherlands B.v., Veldhoven, NL;
Sudhir Srivastava, Eindhoven, NL;
Sander Bas Roobol, Veldhoven, NL;
Simon Gijsbert Josephus Mathijssen, Rosmalen, NL;
Nan Lin, Eindhoven, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Krijn Frederik Bustraan, Eindhoven, NL;
Petrus Wilhelmus Smorenburg, Veldhoven, NL;
Gerrit Jacobus Hendrik Brussaard, Boxtel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element delivers gas in a first direction. The gas delivery element has an optical input and an optical input, defining an optical path running in a second direction. The first direction is arranged relative to the second direction at an angle that is not perpendicular or parallel. Also disclosed is a gas delivery element having a gas jet shaping device, or a pair of gas delivery elements, one of which delivers a second gas, such that the gas jet shaping device or second gas is operable to modify a flow profile of the gas such that the number density of the gas falls sharply.