Eindhoven, Netherlands

Nan Lin

USPTO Granted Patents = 13 

Average Co-Inventor Count = 4.8

ph-index = 2

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2018-2025

Loading Chart...
13 patents (USPTO):

Title: Innovations and Contributions of Nan Lin in Eindhoven, NL

Introduction

Nan Lin is an accomplished inventor based in Eindhoven, Netherlands, known for his significant contributions to the field of illumination technologies and high harmonic generation radiation sources. With a total of 12 patents to his name, he has established himself as a leading figure in innovations that blend advanced optical technologies with practical applications.

Latest Patents

In his recent endeavors, Nan Lin has developed two notable patents:

1. **Illumination source and associated metrology apparatus** - This invention involves an illumination source that includes a gas delivery system with a gas nozzle. The gas nozzle is designed with an exit plane opening, facilitating gas flow to generate emitted radiation at an interaction region. Notably, this illumination source is capable of receiving pump radiation and shaping the gas flow through a specifically designed geometry of the gas nozzle, enhancing gas density in a controlled manner.

2. **HHG source, inspection apparatus and method for performing a measurement** - This patent outlines a method for measurements within an inspection apparatus utilizing a high harmonic generation radiation source. The innovation involves controlling characteristics of a driving laser pulse to manipulate the emission spectrum of illumination radiation. This configuration allows for the generation of discrete harmonic peaks, or alternatively, a monochromatic output emission spectrum by employing multiple driving laser pulses.

Career Highlights

Nan Lin's professional journey is marked by his role at ASML Netherlands B.V., a leading company in the semiconductor industry. His work focuses on the intersection of advanced imaging systems and metrology, contributing to the development of technologies that enhance precision in manufacturing and inspection processes.

Collaborations

Lin has collaborated with esteemed colleagues, including Simon Gijsbert Josephus Mathijssen and Sander Bas Roobol, who share his commitment to innovation in optical engineering. Together, they have worked on projects that push the boundaries of illumination and measurement, furthering advancements in their respective fields.

Conclusion

Nan Lin's inventions and patents reflect a deep understanding of both theoretical and practical aspects of illumination technologies. His work continues to inspire innovation within the industry, making significant contributions that are crucial for the future of high-precision measurement and imaging in semiconductor technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…