The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2019
Filed:
Jan. 19, 2018
Asml Netherlands B.v., Veldhoven, NL;
Simon Gijsbert Josephus Mathijssen, Rosmalen, NL;
Sander Bas Roobol, Veldhoven, NL;
Nan Lin, Eindhoven, NL;
Willem Marie Julia Marcel Coene, Geldrop, NL;
Arie Jeffrey Den Boef, Waalre, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Target structures such as overlay gratings (Ta and Tb) are formed on a substrate (W) by a lithographic process. The first target is illuminated with a spot of first radiation (, Sa) and simultaneously the second target is illuminated with a spot of second radiation (, Sb). A sensor () detects at different locations, portions (+) of said first radiation that have been diffracted in a first direction by features of the first target and portions (+) of said second radiation that have been diffracted in a second direction by features of the second target. Asymmetry in X and Y directions can be detected simultaneously, reducing the time required for overlay measurements in X and Y. The two spots of radiation at soft x-ray wavelength can be generated simply by exciting two locations () in a higher harmonic generation (HHG) radiation source or inverse Compton scattering source.