The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2018
Filed:
Apr. 21, 2017
Asml Netherlands B.v., Veldhoven, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Simon Gijsbert Josephus Mathijssen, Rosmalen, NL;
Sander Bas Roobol, Veldhoven, NL;
Nan Lin, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A structure of interest (T) is irradiated with radiation for example in the x-ray or EUV waveband, and scattered radiation is detected by a detector (). A processor (PU) calculates a property such as linewidth (CD) or overlay (OV), for example by simulating (S) interaction of radiation with a structure and comparing (S) the simulated interaction with the detected radiation. The method is modified (S, S, S) to take account of changes in the structure which are caused by the inspection radiation. These changes may be for example shrinkage of the material, or changes in its optical characteristics. The changes may be caused by inspection radiation in the current observation or in a previous observation.