The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
Nov. 27, 2020
Asml Netherlands B.v., Veldhoven, NL;
Han-Kwang Nienhuys, Veldhoven, NL;
Teis Johan Coenen, Vught, NL;
Sander Bas Roobol, Veldhoven, NL;
Jeroen Cottaar, Eindhoven, NL;
Seyed Iman Mossavat, Waalre, NL;
Niels Geypen, Lommel, BE;
Sandy Claudia Scholz, Veldhoven, NL;
Christina Lynn Porter, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Disclosed is a method of metrology. The method comprises illuminating a radiation onto a substrate; obtaining measurement data relating to at least one measurement of each of one or more structures on the substrate; using a Fourier-related transform to transform the measurement data into a transformed measurement data; and extracting a feature of the substrate from the transformed measurement data, or eliminating an impact of a nuisance parameter.