The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2025
Filed:
Jan. 28, 2020
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Sander Bas Roobol, Veldhoven, NL;
Sietse Thijmen Van Der Post, Utrecht, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
B29D 11/0074 (2013.01); G03F 7/0005 (2013.01); G03F 7/7085 (2013.01);
Abstract
Disclosed is a method of manufacturing a reflector. The method comprises polishing () at least the uppermost surface of the uppermost substantially flat substrate of a plurality of substantially flat substrates, deforming () each substantially flat substrate into the desired shape, and bonding () the deformed substrates together to form said reflector. In an embodiment, the deforming and bonding is performed together using a mold.