Asml Netherlands B.v.

Sander Bas Roobol

Simon Gijsbert Josephus Mathijssen

Nan Lin

Sietse Thijmen Van Der Post

Arie Jeffrey Den Boef

Petrus Wilhelmus Smorenburg

Gerrit Jacobus Hendrik Brussaard

Teis Johan Coenen

Peter Danny Van Voorst

Niels Geypen

Sjoerd Nicolaas Lambertus Donders

Patricius Aloysius Jacobus Tinnemans

Han-Kwang Nienhuys

Ferry Zijp

Krijn Frederik Bustraan

Sudhir Srivastava

Pieter-Jan Van Zwol

Willem Marie Julia Marcel Coene

Yang-Shan Huang

Richard Quintanilha

Sarathi Roy

Tamara Druzhinina

Nitish Kumar

Stefan Michael Bruno Bäumer

Sipke Jacob Bijlsma

Johannes Franciscus Martinus D'Achard Van Enschut

Sandy Claudia Scholz

Pavel Evtushenko

Disclosed is a method of manufacturing a reflector. The method comprises polishing () at least the uppermost surface of the uppermost substantially flat substrate of a plurality of substantially flat substrates, deforming () each substantially flat substrate into the desired shape, and bonding () the deformed substrates together to form said reflector. In an embodiment, the deforming and bonding is performed together using a mold.

Reflector manufacturing method and associated reflector

A radiation source arrangement causes interaction between pump radiation () and a gaseous medium () to generate EUV or soft x-ray radiation by higher harmonic generation (HHG). The operating condition of the radiation source arrangement is monitored by detecting () third radiation () resulting from an interaction between condition sensing radiation and the medium. The condition sensing radiation () may be the same as the first radiation or it may be separately applied. The third radiation may be for example a portion of the condition sensing radiation that is reflected or scattered by a vacuum-gas boundary, or it may be lower harmonics of the HHG process, or fluorescence, or scattered. The sensor may include one or more image detectors so that spatial distribution of intensity and/or the angular distribution of the third radiation may be analyzed. Feedback control based on the determined operating condition stabilizes operation of the HHG source.

Methods and apparatus for predicting performance of a measurement method, measurement method and apparatus

Methods and apparatus for determining an intensity profile of a radiation beam. The method comprises providing a diffraction structure, causing a relative movement of the diffraction structure relative to the radiation beam from a first position, wherein the radiation beam does not irradiate the diffraction structure to a second position, wherein the radiation beam irradiates the diffraction structure, measuring, with a radiation detector, diffracted radiation signals produced from a diffraction of the radiation beam by the diffraction structure as the diffraction structure transitions from the first position to the second position or vice versa, and determining an intensity profile of the radiation beam based on the measured diffracted radiation signals.

Method and apparatus for determining a radiation beam intensity profile

Disclosed is a method and associated inspection apparatus for detecting variations on a surface of a substrate. The method comprises providing patterned inspection radiation to a surface of a substrate. The inspection radiation is patterned such that an amplitude of a corresponding enhanced field is modulated in a manner corresponding to the patterned inspection radiation. The scattered radiation resultant from interaction between the enhanced field and the substrate surface is received and variations on the surface of the substrate are detected based on the interaction between the enhanced field and the substrate surface. Also disclosed is a method of detecting any changes to at least one characteristic of received radiation, the said changes being induced by the generation of a surface plasmon at said surface of the optical element.

Method and apparatus for detecting substrate surface variations

A method of aligning a diffractive optical system, to be operated with an operating beam, comprises: aligning () the diffractive optical system using an alignment beam having a different wavelength range from the operating beam and using a diffractive optical element optimized () to diffract the alignment beam and the operating beam in the same (or a predetermined) direction. In an example, the alignment beam comprises infra-red (IR) radiation and the operating beam comprises soft X-ray (SXR) radiation. The diffractive optical element is optimized by providing it with a first periodic structure with a first pitch (pIR) and a second periodic structure with a second pitch (pSXR). After alignment, the vacuum system is pumped down () and in operation the SXR operating beam is generated () by a high harmonic generation (HHG) optical source pumped by the IR alignment beam' optical source.

Methods of aligning a diffractive optical system and diffracting beams, diffractive optical element and apparatus

A detector for detecting diffracted radiation which has been diffracted by a regular structure; said detector comprises: a sensor for sensing at least a portion of said diffracted radiation, said sensor having a first region and a second region; a first coating configured to allow transmission of radiation with wavelengths within a first range of wavelengths; and a second coating configured to allow transmission of radiation with wavelengths within a second range of wavelengths; wherein said first coating coats said first region of said sensor, and said second coating coats said second region of said sensor, and wherein said first and second regions are different regions.

Optical detector

Disclosed is a method of performing a measurement in an inspection apparatus, and an associated inspection apparatus and HHG source. The method comprises configuring one or more controllable characteristics of at least one driving laser pulse of a high harmonic generation radiation source to control the output emission spectrum of illumination radiation provided by the high harmonic generation radiation source; and illuminating a target structure with said illuminating radiation. The method may comprise configuring the driving laser pulse so that the output emission spectrum comprises a plurality of discrete harmonic peaks. Alternatively the method may comprise using a plurality of driving laser pulses of different wavelengths such that the output emission spectrum is substantially monochromatic.

HHG source, inspection apparatus and method for performing a measurement

In a method of determining an edge roughness parameter of a periodic structure, the periodic structure is illuminated () in an inspection apparatus. The illumination radiation beam may comprise radiation with a wavelength in the range 1 nm to 100 nm. A scattering signal () is obtained from a radiation beam scattered from the periodic structure. The scattering signal comprises a scattering intensity signal that is obtained by detecting an image of a far-field diffraction pattern in the inspection apparatus. An edge roughness parameter, such as Lined Edge Roughness and/or Line Width Roughness is determined () based on a distribution of the scattering intensity signal around a non-specular diffraction order. This may be done for example using a peak broadening model.

Determining an edge roughness parameter of a periodic structure

A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the structure having diffractive properties, the apparatus comprising: focusing optics configured to focus illumination radiation comprising a plurality of wavelengths onto the structure; a first detector configured to detect at least part of the illumination radiation which has been diffracted from the structure; and additional optics configured to produce, on at least a portion of the first detector, a wavelength-dependent spatial distribution of different wavelengths of the illumination radiation which has been diffracted from the structure, wherein the first detector is arranged to detect at least a non-zero diffraction order of the illumination radiation which has been diffracted from the structure.

Metrology apparatus for and a method of determining a characteristic of interest of a structure on a substrate

Disclosed is an illumination source apparatus comprising a high harmonic generation medium, a pump radiation source and a spatial filter. The pump radiation source emits a beam of pump radiation having a profile comprising no pump radiation in a central region of the beam and excites the high harmonic generation medium so as to generate high harmonic radiation. The pump radiation and the generated high harmonic radiation are spatially separated beyond the focal plane of the beam of pump radiation. The spatial filter is located beyond a focal plane of the beam of pump radiation, and blocks the pump radiation. Also disclosed is a method of generating high harmonic measurement radiation optimized for filtration of pump radiation therefrom.

Illumination source for an inspection apparatus, inspection apparatus and inspection method

Disclosed is a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a pump radiation source is operable to emit pump radiation at a high harmonic generation gas medium thereby exciting the high harmonic generation gas medium within a pump radiation interaction region so as to generate the high harmonic radiation and an ionization radiation source is operable to emit ionization radiation at the high harmonic generation gas medium to ionize a gas at an ionization region between the pump radiation interaction region and an optical output of the illumination source.

Apparatus for delivering gas and illumination source for generating high harmonic radiation

A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.

Method and apparatus for inspection and metrology

Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element delivers gas in a first direction. The gas delivery element has an optical input and an optical input, defining an optical path running in a second direction. The first direction is arranged relative to the second direction at an angle that is not perpendicular or parallel. Also disclosed is a gas delivery element having a gas jet shaping device, or a pair of gas delivery elements, one of which delivers a second gas, such that the gas jet shaping device or second gas is operable to modify a flow profile of the gas such that the number density of the gas falls sharply.

Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.

Target structures such as overlay gratings (Ta and Tb) are formed on a substrate (W) by a lithographic process. The first target is illuminated with a spot of first radiation (, Sa) and simultaneously the second target is illuminated with a spot of second radiation (, Sb). A sensor () detects at different locations, portions (+) of said first radiation that have been diffracted in a first direction by features of the first target and portions (+) of said second radiation that have been diffracted in a second direction by features of the second target. Asymmetry in X and Y directions can be detected simultaneously, reducing the time required for overlay measurements in X and Y. The two spots of radiation at soft x-ray wavelength can be generated simply by exciting two locations () in a higher harmonic generation (HHG) radiation source or inverse Compton scattering source.

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Veldhoven, Netherlands

Sander Bas Roobol