The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2025
Filed:
Mar. 20, 2020
Asml Netherlands B.v., Veldhoven, NL;
Tamara Druzhinina, Eindhoven, NL;
Jim Vincent Overkamp, Eindhoven, NL;
Alexey Olegovich Polyakov, Veldhoven, NL;
Teis Johan Coenen, Vught, NL;
Evgenia Kurganova, Nijmegen, NL;
Ionel Mugurel Ciobica, Eindhoven, NL;
Alexander Ludwig Klein, Eindhoven, NL;
Albertus Victor Gerardus Mangnus, Eindhoven, NL;
Marijke Scotuzzi, Eindhoven, NL;
Bastiaan Maurice Van Den Broek, Sprang-Capelle, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated during a deposition process, the irradiation being such as to locally drive the deposition process in the selected portion to form a layer of deposited material in a pattern defined by the selected portion. The deposited material is annealed to modify the deposited material.